Аннотация к книге "Boron nitride thin films. deposited by magnetron sputtering on Si3N4"
In this work we present the results of the thin films of boron nitride deposited by D.C. and R.F. magnetron sputtering from hot-pressed B4C and h-BN targets on two different substrates: Si3N4 ceramics with different surface finishing and Si(100) wafers. The influence of parameters such as substrate temperature and working gas composition ratio (N2 or Ar), on film thickness, deposition rate, cristallinity, residual stress, phase composition and hardness, were systematically investigated using techniques like SEM, XRD, FT-IR and nanohardness.
Данное издание не является оригинальным. Книга печатается по технологии принт-он-деманд после получения заказа.
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