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Multiple patterning

Код 3415665

  • ISBN: 978-5-5087-8493-5

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High Quality Content by WIKIPEDIA articles! Multiple patterning is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of features. The resolution of a photoresist pattern begins to blur at around 45 nm half-pitch. For the semiconductor industry, therefore, double patterning was introduced for the 32 nm half-pitch node and below, mainly using state-of-the-art 193 nm immersion lithography tools.

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ISBN: 978-5-5087-8493-5

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Градостроительство и архитектура Домашние животные Путешествия, туризм, природа

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