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Sensor-based Modeling and Monitoring of Chemical Mechanical Polishing. Analysis of Experimental Sensor Data Integrating Statistical Time Series Analysis and Nonlinear Dynamics (Chaos Theory) Paradigms

Код 904165

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Аннотация к книге "Sensor-based Modeling and Monitoring of Chemical Mechanical Polishing. Analysis of Experimental Sensor Data Integrating Statistical Time Series Analysis and Nonlinear Dynamics (Chaos Theory) Paradigms"

This book provides a framework for real time control of the Chemical Mechanical Planarization (CMP) process based on combining nonlinear dynamics principles with statistical process monitoring approaches. CMP has a direct bearing on the computational speed and dimensional characteristics of solid state devices. The challenge in CMP may be narrowed to domains enveloping productivity, measured in terms of material removal rate (MRR), and quality which is usually specified in terms of surface...

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Издательство: Книга по требованию
Дата выхода: июль 2011
ISBN: 978-3-6390-3564-3
Объём: 208 страниц
Масса: 338 г
Размеры(высота, ширина, толщина), см: 23 x 16 x 2

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